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Abrasive Slurries and Recycling Expert for Solar and Semiconductor Wire Saw Operations

Technical Consultant #1788


  • Semiconductor and solar wire saw operation and processes.
  • Suspension carrier and slurry product development with 14 patents applications pending.
  • Slurry and wire saw process modeling systems to optimize slurry performance and wire saw cut parameters.
  • Development, application, test method development, manufacturing processes, and production usage of unique long-term stable suspension carrier systems, slurry recycling processes, environmental waste reduction, cost reduction and materials conservation techniques for the wire saw and abrasive slurry industries.
  • Design, operation and development of spent slurry recycling techniques, equipment systems, processes for recovery of spent abrasive slurry from wire saw ingot slicing.
  • Polymer identification techniques such as D.T.A., T.G.A., G.P.C., H.P. membrane osmometry and others.
  • Photo-resist synthetic, formulation, and processing. Familiar with most photolithographic fabrication processes, techniques and instrumentation.
  • Pellicle formulation, fabrication and applications (4 patents filed).
  • Microelectronics Integrated Circuit Fabrication Industry; wafer processing; specialty electronics chemicals development, applications and recycling techniques.


Undisclosed Company, Founder and President, 2000 - Present

  • Design, set-up of state-of-the-art research and development, applications, Q.C. laboratories for development of world's first "long-term" stable suspension carrier system for wire saw abrasive slurry slicing of Si ingots into wafers for semiconductor and solar applications.
  • Development of first PEG based carrier system that provides long-term stable abrasive slurries for wire saw slicing (SSL Carrier System).
  • Primary technology source for design and operation requirements for full carrier system manufacturing plant capable of producing up to 10,000 gals. of SSL carrier and customer specified slurries.
  • Major contributor to development design and construction of world's first wire saw slurry recycling plant for recovery of spent wire saw SSL slurry used by semiconductor and solar wafering customers.
  • Co-inventor of world's first 100% water based stable slurry suspension carrier system (LVS).
  • Primary responsibility for patent application preparation for all developments and filed patent applications.
  • Primary inventor of corrosion inhibitor system for use with water based carriers and wire saw slurries.
  • Contributor to development of modeling system used to optimize slurry usage on any wire saw for best performance at lowest cost.
  • Primary instructor to new and existing employees on wire saw processes, run parameters, integration of abrasive slurry into wire saw set-up and parametric importance of slurry - wire saw interactions that result in overall wafer quality level.
  • Designed and built full technical, Q.C., applications and production infrastructure in less than 2 years.
  • Company designed and built state of the art manufacturing plant for full production of highest purity form of aqueous-HA product line for Semiconductor and pharmaceutical markets.
  • Negotiated and implemented global representation organization for product sales throughout Europe, U.S., Japan, Singapore, Korea and Taiwan.
  • Three patents issued for company developed advanced technology and purification processes.
  • Contract guaranteed sales revenues of $6 million in hand at start of manufacturing.

Ashland/ACT (Business Unit of Ashland Chemical Co.), Director, 1994 - 1997

  • Increased business revenues from $14 million in three years to $5 million.
  • At least 60% revenue growth for 4 consecutive years.
  • Recipient of Business Profitability award from Ashland Corporate 2 consecutive years.
  • Grew ACT to world's second largest supplier of semiconductor based stripper products and technology behind EKC Tech., Inc. with revenues near $50 million per year.
  • Ashland Chemical "Outstanding Business Unit Performance."
  • Ashland Chemical "Outstanding Business Unit Award."
  • Ashland Chemical "ISO Certification Achievement Award."

ACT Inc., Allentown, PA, Co-Founder and President, 1987 - 1991

Chief Technology Officer and BOD Chairman, 1991 - 1994

  • Co-founded ACT with $6,000, built infrastructure, technology base, advanced products and customer base from successful funding grants.
  • Designed and built technical laboratories, production facilities, tolling partner, packaging and logistics infrastructure under minimal budget resources.
  • Designed and built sales and marketing strategy, customer presentations, value added proposition presentations, represented based sales force.
  • Designed and built first global technical applications department for advanced semiconductor stripper products and technology.
  • Primary or co-inventor of all company products (10-15 patents issued).
  • Grew revenue base from $0 to over $14 million over a 6 year period with no external investors, save but BFP of PA.
  • Gross revenue growth rate hit 100% per year, for 4 consecutive years.
  • Market potential and global acceptance of ACT established advanced stripper products and technology attracted several major acquisition candidates.
  • Recipient of Ben Franklin annual "New Product" award in recognition of significant advances made in the Semiconductor I.C. fabrication industry.

Environmental Management Assoc., Inc., Bethlehem, PA, Vice President R&D, 1985 - 1987

  • Principle inventor of major products (i.e. resist strippers), 3 patents issued.
  • Full establishment of market accepted stripper product line.
  • Inventor of new resin system for photo mask protection - 1 patent filed.
  • Set up and establish full Q.C. and applications labs.
  • Designed and built class 100 clean room.

J.T. Baker Chemical Company, Phillipsburg, N.J., Principal Scientist and Project Leader, 1979 - 1985

Photoresist and Electronic Chemicals

  • Principal inventor of non-toxic, sink disposal positive resist stripper - 5 patents issued; PRS-1000.
  • Sole inventor of newly introduced anti-reflective coating used to eliminate standing wave effects on photoresists coated on reflective substrates - 2 patent disclosures filed.
  • Principal inventor of new experimental high temperature positive photoresist utilizing proprietary synthetic photosensitizer-binder resin systems - 2 patent disclosures in progress.
  • Sole inventor of proprietary resin system used as protective pellicle for projection and stepper masks - 3 patents issued.

Honors & Publications

Academic and Professional Affiliations

  • American Chemical Society
  • SPIE (Society of Photo-Optical Instrumentation Engineers)
  • SEMI (Semiconductor Equipment and Materials Institute)
  • SEMI-Photolithographic Chemicals Subcommittee


  • Ashland Chemical "Record Profitability Award"
  • Pennsylvania Ben Franklin Partnership New Product Innovation
  • PA Ben Franklin Partnership Entrepreneurial Grant Awards
  • Ashland Chemical "Outstanding Business Unit Performance'
  • Ashland Chemical "Outstanding Business Unit Award"
  • Ashland Chemical "ISO Certification Achievement Award"

Publications and Patents

  • Five publications and 21 patents.


  • Ph.D. Organic Chemistry, Western Michigan University, Kalamazoo, MI
  • M.S. Organic Chemistry, Western Michigan University, Kalamazoo, MI
  • B.S. Chemistry, Rose Polytechnic Institute, Terre Haute, IN
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