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Optical and Polarimetry Consultant: Surface and Thin Film Characterization; Optical Instruments

Technical Consultant #1685


Expertise

  • Polarimetry techniques to study surfaces and periodic structures.
  • Polarimetry technology applied to lithography and photonic structures.
  • Mueller polarimetry and Mueller matrices optics and advanced developments.
  • Metrology technology, metrology study groups and metrology equipment suppliers.
  • Optical and polarization characterization of nanomaterials.
  • Optic instrumentation applied to thin films deposition technologies including epitaxial deposited thin films.
  • Optics thin films Instrumentation: spectroellipsometry (SE), Infrared (IRSE) and Ultra Violet Ellipsometry (VUVSE).
  • Thin films semiconductor new materials
  • Continuous Instrumental development of characterization developing simulation software.
  • Educator of current developments in optical in thin films and physical properties of nanotechnology materials.
  • Research and development in optical characterization.

Experience

Undisclosed Laboratory, France, Research Project Leader and Consultant, Present

Undisclosed Company, France, 2000 - Present

  • Senior Expert: Research and development in optical characterization.
  • Project Leader: VUV Ellipsometry Mueller Matrix Polarimetry Scatterometry, Mueller Polarimetry.

CNET, CNS Meylan, France Telecom, Research and Development, 1980 - 1999

  • Thin films optical characterization instruments: ellipsometry, visible and infra red and reflectometry.
  • Laser induced temperature and ionic implantation.

Independent Consultant

  • For various Metrology groups: Horiba Scientific, SOPRA-Lab , KLA Tencor.
  • First spectroellipsometry (SE), developments in the visible and infra red range with SOPRA inc.

IBM, T. J. Watson Research Center, Yorktown Height, NY, 1978 - 1979

  • Postdoctoral - 2-D paramagnet LB materials.

Commissariat Energie Atomique, (CEA) France, 1975 - 1978

  • Center for Nuclear Studies in Grenoble: Thesis; Magnetism Nuclear relaxation OverHauser effect.

Univercidad Nacional de Ingenieria (U l ) Casilla, Lima, Peru, Physics Department, 1974 - 1975

  • Educator for the National University of Engineering, Student Thesis Director.

CEA, France, Department of Fundamental Research, 1970 - 1974

  • Magnetic Resonance laboratory, research work in solid state, 1971 - 1974
  • CEA, Laboratory University, Analytical Chemistry Mass Spectrometry, 1970

Honors & Publications


Academic and Professional Affiliations

  • OSA member referee, (Optical Society of America) European Journal of Applied Physics, Thin Solid Films (TSF).
  • Thesis referee and reports, University Paris and at Ecole Polytechnique, Paris.

Publications

  • 54 peer review publications.
  • 4 U.S. Patents.

Education

  • Ph.D. Postdoctoral, Solid State Physics, Grenoble University, France
  • M.S. Physics , Grenoble University, France
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